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Mathematics, 14.10.2020 01:01 tristantisdale1

3. A new process has been developed for applying pho­ toresist to 125-mm silicon wafers used in manufac­ turing integrated circuits. Ten wafers were tested, and the following photoresist thickness measurements (in angstroms x 1,000) were observed: 13.3987, 13.3957, 13.3902, 13.4015, 13.4001, 13.3918, 13.3965, 13.3925, 13.3946, and 13.4002. a. Test the hypothesis that mean thickness is 13.4 x 1,000 A. Use a = 0.05 and assume a two-sided alternative. b. Find a 99% two-sided confidence interval on mean photoresist thickness. Assume that thickness is normally distributed.

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