Explain the concept of optical lithography for the purpose of forming patterns in SiO2 films on Si wafers.

Steam enters a converging nozzle at 3.0 mpa and 500°c with a at 1.8 mpa. for a nozzle exit area of 32 cm2, determine the exit velocity, mass flow rate, and exit mach number if the nozzle: negligible velocity, and it exits (a) is isentropic (b) has an efficiency of 94 percent

For each of the following process: a) sketch the p-v diagram, b)sketch t-s diagram, c) sketch t-v diagram, d) sketch the boundary work on one of the diagrams (a, b or c) and e) sketch the reversible heat transfer on one of the diagrams (a, b or c): 1- isobaric process from compressed liquid to superheated vapor 2- isothermal process from compressed liquid to superheated vapor 3- isentropic process from compressed liquid to superheated vapor

Air enters a horizontal, constant-diameter heating duct operating at steady state at 290 k, 1 bar, with a volumetric flow rate of 0.25 m°/s, and exits at 325 k, 0.95 bar. the flow area is 0.04 m2. assuming the ideal gas model with k = 1.4 for the air, determine (a) the velocity at the inlet and exit, each in m/s, and (c) the rate of heat transfer, in kw flow rate, in kg/s, (b) the mass kg 0.3