What is the angle in degrees w. r.t. the vertical of the photoresist if it is given a perfect exposure (bright areas are above clearing dose, and no photons hit areas that are supposed to be dark). the photoresist is 1.4 microns high, and it is given a 100% over development. the exposed resist is removed in the developer at 156 nm/s and the unexposed resist is removed in the developer at 0.23 nm/s. (two significant figures, fixed point notation, assume resist height is 1.4 microns)