Consider a single crystal of silver oriented such that a tensile stress is applied along a [001] direction. if slip occurs on a (111) plane and in a direction, and is initiated at an applied tensile stress of 1.1 mpa, compute the critical resolved shear stress.

If the thermal strain developed in polyimide film during deposition is given as 0.0044. assume room temperature is kept at 17.3 c, and thermal coefficient of expansion for the film and the substrate are 54 x 10^-6c^-1 and 3.3 x 10^-6c^-1respectively. calculate the deposition temperature.

Determine whether or not it is possible to compress air adiabatically from k to 140 kpa and 400 k. what is the entropy change during this process?

Slip occurs via two partial dislocations because of (a) the shorter path of the partial dislocation lines; (b) the lower energy state through partial dislocations; (c) the charge balance.