Asilicon dioxide film formed on the surface of a silicon wafer by thermal oxidation has a thickness that is
(a) greater than, (b) less than, or (c) the same as the layer of substrate silicon used to form it.

less thickness

Explanation:

Thermal oxidation is a process where only the surface atoms react and are converted into the silicon dioxide, so unless you have a layer of silicon wafer of a one atom thickness, the thickness of the silicon dioxide will always be thinner than the silicon wafer.

d would be the most obvious choice to this question. leaders are supposed to herd their underlings like a shepherd to sheep. a leader should also listen to others when they are talking to one other to gain a better understanding of their mission and surroundings.

explanation: