Write the following measurements and scientific notation:
1. 800,000,000 m
2. 0.0015 kg

Silica, sio2, is formed on silicon as an electrically insulating layer for microelectronic devices. silica is formed when silicon is exposed to o2 gas at an elevated temperature. at 900˚c, it takes 90 minutes for the oxygen to diffuse from the surface to form a 0.06 micron (0.06 x 10-6 m) thick layer of sio2 on

If 10.g of agno3 is available, what volume of 0.25 m agno3 can be prepared

Compare and contrast physical changes with chemical changes.