33.7 (SI units) It is desired to etch out a region of a silicon dioxide film on the surface of a silicon wafer. The SiO2 film is 100 nm thick. The width of the etched-out area is specified to be 650 nm. (a) If the degree of anisotropy for the etchant in the process is known to be 1.25, what should be the size of the opening in the mask through which the etchant will operate

Consider a culture medium on which only gram-positive organisms such as staphylococcus aureus colonies can grow due to an elevated nacl level. a yellow halo surrounds the growth, indicating the bacterium fermented a sugar in the medium, decreasing the ph as a result and changing the color of a ph indicator chemical. this type of medium would be referred to as a differential and enrichment culture.