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Silica, sio2, is formed on silicon as an electrically insulating layer for microelectronic devices. silica is formed when silicon is exposed to o2 gas at an elevated temperature. at 900Ëšc, it takes 90 minutes for the oxygen to diffuse from the surface to form a 0.06 micron (0.06 x 10-6 m) thick layer of sio2 on
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Chemistry, 22.06.2019 03:30
Select the correct answer. when carbon dioxide dissolves in water, it sometimes reacts with water to form carbonic acid as in this balanced equation: co2 + h2o → h2co3. if 495 milliliters of carbon dioxide at 25°c and 101.3 kilopascals reacts with excess water, what is the theoretical yield of carbonic acid? use the periodic table and the ideal gas resource a. 0.889 g b. 1.10g c. 1.27g d. 2.02g what's the answer! quick!
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Chemistry, 22.06.2019 14:30
Consider the reduction reactions and their equilibrium constants. cu+(aq)+e−↽−−⇀cu(s)pb2+(aq)+2e−↽−−⇀pb(s)fe3+(aq)+3e−↽−−⇀fe(=6.2×108=4.0×10−5=9.3×10−3 cu + ( aq ) + e − ↽ − − ⇀ cu ( s ) k =6.2× 10 8 pb 2 + ( aq ) +2 e − ↽ − − ⇀ pb ( s ) k =4.0× 10 − 5 fe 3 + ( aq ) +3 e − ↽ − − ⇀ fe ( s ) k =9.3× 10 − 3 arrange these ions from strongest to weakest oxidizing agent.
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