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Chemistry, 21.06.2019 16:00
Silica, sio2, is formed on silicon as an electrically insulating layer for microelectronic devices. silica is formed when silicon is exposed to o2 gas at an elevated temperature. at 900˚c, it takes 90 minutes for the oxygen to diffuse from the surface to form a 0.06 micron (0.06 x 10-6 m) thick layer of sio2 on
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Chemistry, 22.06.2019 14:20
Which of the following are sources of revenue for media companies? a. direct sales to producers b.advertising and subscriptions c. online purchase d. capital investments
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Chemistry, 22.06.2019 23:00
What is the oxidation state of each individual carbon atom in c2o42−?
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For the reaction 2Na + 2H2O ® 2NaOH + H2, how many grams of sodium hydroxide are produced from 2.0 m...
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