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Silica, sio2, is formed on silicon as an electrically insulating layer for microelectronic devices. silica is formed when silicon is exposed to o2 gas at an elevated temperature. at 900˚c, it takes 90 minutes for the oxygen to diffuse from the surface to form a 0.06 micron (0.06 x 10-6 m) thick layer of sio2 on

In a water molecule, hydrogen and oxygen are held together by a(an) bond. a) double covalent b) ionic c) nonpolar covalent d) hydrogen e) polar covalent

How many moles of sulfur dioxide are produced when 4.38 moles of oxygen completely react with iron (iv) sulfide