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Silica, sio2, is formed on silicon as an electrically insulating layer for microelectronic devices. silica is formed when silicon is exposed to o2 gas at an elevated temperature. at 900Ëšc, it takes 90 minutes for the oxygen to diffuse from the surface to form a 0.06 micron (0.06 x 10-6 m) thick layer of sio2 on
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Which of the following electromagnetic waves can create ions?
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How many moles are in 2.5 g of N2
O 0089 moles
0.18 moles
13 moles
11 moles...
O 0089 moles
0.18 moles
13 moles
11 moles...
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