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Silica, sio2, is formed on silicon as an electrically insulating layer for microelectronic devices. silica is formed when silicon is exposed to o2 gas at an elevated temperature. at 900Ëšc, it takes 90 minutes for the oxygen to diffuse from the surface to form a 0.06 micron (0.06 x 10-6 m) thick layer of sio2 on
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How many atoms of mg are present in 97.22 grams of mg? 6.022 × 1023 2.408 × 1024 4.818 × 1024 5.855 × 1025
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The fact that the total amount of energy in a system remains constant is a(n)
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