Answer all of them, please

Silica, sio2, is formed on silicon as an electrically insulating layer for microelectronic devices. silica is formed when silicon is exposed to o2 gas at an elevated temperature. at 900˚c, it takes 90 minutes for the oxygen to diffuse from the surface to form a 0.06 micron (0.06 x 10-6 m) thick layer of sio2 on

Ais a mountain created from eruptions of lava, ash, rocks, and hot gases.

Consider the reduction reactions and their equilibrium constants. cu+(aq)+e−↽−−⇀cu(s)pb2+(aq)+2e−↽−−⇀pb(s)fe3+(aq)+3e−↽−−⇀fe(=6.2×108=4.0×10−5=9.3×10−3 cu + ( aq ) + e − ↽ − − ⇀ cu ( s ) k =6.2× 10 8 pb 2 + ( aq ) +2 e − ↽ − − ⇀ pb ( s ) k =4.0× 10 − 5 fe 3 + ( aq ) +3 e − ↽ − − ⇀ fe ( s ) k =9.3× 10 − 3 arrange these ions from strongest to weakest oxidizing agent.